Revisit pattern collapse for 14nm node and beyond
- Kenji Yoshimoto
- Craig Higgins
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paper
Publications
3606 results for Mathematical Sciences
Self-assembly patterning for sub-15nm half-pitch: A transition from lab to fab
- Chris Bencher
- Jeffrey Smith
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperIntegrated model-based retargeting and optical proximity correction
- Kanak B. Agarwal
- Shayak Banerjee
- 2011
- SPIE Advanced Lithography 2011
Conference paperSingle exposure contacts are dead. Long live single exposure contacts!
- Henning Haffner
- Martin Ostermayr
- et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paperQuantitative analysis of parallelism and data movement properties across the Berkeley computational motifs
- Victoria Caparrós Cabezas
- Phillip Stanley-Marbell
- 2011
- CF 2011
Conference paperStrengthening lattice-free cuts using non-negativity
- Ricardo Fukasawa
- Oktay Günlük
- 2011
- Discrete Optimization
PaperA note on the MIR closure and basic relaxations of polyhedra
- Sanjeeb Dash
- Oktay Günlük
- et al.
- 2011
- Operations Research Letters
PaperOn the linear relaxation of the p-median problem
- Mourad Baïou
- Francisco Barahona
- 2011
- Discrete Optimization
PaperField of view extension using frequency division multiple access technique: Numerical analysis
- Zahra Kavehvash
- Khashayar Mehrany
- et al.
- 2011
- Proceedings of SPIE - The International Society for Optical Engineering 2011
Conference paperNd-doped waveguide amplifiers for heterogeneous integration in optical backplanes
- Feridun Ay
- Jing Yang
- et al.
- 2011
- SPIE Photonics West 2011
Conference paper