Publications

3613 results for Mathematical Sciences

Bound PAG resists: An EUV and electron beam lithography performance comparison of fluoropolymers
- - Luisa D. Bozano
  - Phillip J. Brock
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paper
Fundamental investigation of Negative Tone Development (NTD) for the 22nm node (and beyond)
- - Guillaume Landie
  - Yongan Xu
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paper
Performance of tri-layer process required for 22nm and beyond
- - Yayi Wei
  - Martin Glodde
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paper
Systematic studies on reactive ion etch-induced deformations of organic underlayers
- - Martin Glodde
  - Sebastian Engelmann
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paper
Hexafluoroalcohol (HFA) containing molecular resist materials for high resolution lithographic applications
- - Anuja De Silva
  - Linda K. Sundberg
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paper
Revisit pattern collapse for 14nm node and beyond
- - Kenji Yoshimoto
  - Craig Higgins
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paper
Self-assembly patterning for sub-15nm half-pitch: A transition from lab to fab
- - Chris Bencher
  - Jeffrey Smith
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paper
Optimization of pitch-split double patterning photoresist for applications at the 16nm node
- - Steven J. Holmes
  - Cherry Tang
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paper
Critical challenges for "non-critical" layers
- - J.M. Gomez
  - I.Y. Popova
  - et al.
- 2011
- SPIE Advanced Lithography 2011
Conference paper
Integrated model-based retargeting and optical proximity correction
- - Kanak B. Agarwal
  - Shayak Banerjee
- 2011
- SPIE Advanced Lithography 2011
Conference paper