Understanding the trade-offs of thinner binary mask absorbers
- Jaione Tirapu-Azpiroz
- Gregory McIntyre
- et al.
- 2010
- SPIE Photomask Technology + EUV Lithography 2010
Conference paper
Publications
3606 results for Mathematical Sciences
Two complementary methods to characterize long range proximity effects due to develop loading
- Linda K. Sundberg
- Greg M. Wallraff
- et al.
- 2010
- SPIE Photomask Technology + EUV Lithography 2010
Conference paperCell blade based H.264 video encoding engine for large scale video surveillance applications
- Ligang Lu
- Brent Paulovicks
- et al.
- 2010
- VCIP 2010
Conference paperStructural properties of optimal schedules with preemption
- Ph. Baptiste
- J. Carlier
- et al.
- 2010
- Journal of Applied and Industrial Mathematics
Paper3D-AFM enhancement for CD metrology dedicated to lithography sub-28-nm node requirements
- Johann Foucher
- Narender Rana
- et al.
- 2010
- SPIE Advanced Lithography 2010
Conference paperStabilizer subsystem codes with spatially local generators
- Sergey Bravyi
- 2010
- ITW 2010
Conference paperHybrid reference metrology exploiting patterning simulation
- Narender Rana
- Chas Archie
- 2010
- SPIE Advanced Lithography 2010
Conference paperQuantum channel capacities
- Graeme Smith
- 2010
- ITW 2010
Conference paperSimultaneous measurement of optical properties and geometry of resist using multiple scatterometry gratings
- Alok Vaid
- Matthew Sendelbach
- et al.
- 2010
- SPIE Advanced Lithography 2010
Conference paperSpatial signature in local overlay measurements - "what CD-SEM can tell us and optical measurements can not"
- Scott Halle
- Daniel Moore
- et al.
- 2010
- SPIE Advanced Lithography 2010
Conference paper