The atomic structure of the NiSi2~Si(111) interface
- E.J. van Loenen
- 1986
- JVSTA
Paper
Publications
176 results at JVSTA
Calorimetry in thin film processing
- S. Shivashankar
- B. Robinson
- 1986
- JVSTA
PaperCharacterization of electron-beam deposited tungsten films on sapphire and silicon
- J.H. Souk
- J.F. O'Hanlon
- et al.
- 1985
- JVSTA
PaperFormation of TiSi2 and TiN during nitrogen annealing of magnetron sputtered Ti films
- E.D. Adams
- K.Y. Ahn
- et al.
- 1985
- JVSTA
PaperSummary Abstract: Raman scattering at buried semiconductor-metal interfaces
- J.C. Tsang
- 1985
- JVSTA
PaperSecondary electron effect on power-voltage relationship in rf sputtering
- B. Bumble
- J.J. Cuomo
- 1985
- JVSTA
PaperSummary Abstract: Resistivity-process relationships in TiSi2 formed from Ti-Si reaction couples
- H.-O. Blom
- S. Berg
- et al.
- 1985
- JVSTA
PaperSummary Abstract: Chemical processes in fluorine-based etching reactions
- F.R. McFeely
- 1985
- JVSTA
PaperStress modification of WSi2.2 films by concurrent low energy ion bombardment during alloy evaporation
- D.S. Yee
- J. Floro
- et al.
- 1985
- JVSTA
PaperChemical reactions at Pt/oxide/Si and Ti/oxide/Si interfaces
- M. Liehr
- F.K. LeGoues
- et al.
- 1985
- JVSTA
Paper