Bench evaluation of lithographic lenses from measurements of the point spread function
- Norman Bobroff
- Petra Fadi
- et al.
- 1989
- Proceedings of SPIE 1989
Conference paper
Publications
9270 results for Computer Science
Practical characterization of 0.5 μm optical lithography
- Donis G. Flagello
- Andrew T. S. Pomerene
- 1989
- Proceedings of SPIE 1989
Conference paperTwo-regime ablative hole formation process in tellurium and tellurium-alloy films
- M. Chen
- V. Marrello
- et al.
- 1989
- Proceedings of SPIE 1989
Conference paperChemical and physical aspects of multilayer resist processing
- J. Paraszczak
- E. Babich
- et al.
- 1989
- Proceedings of SPIE 1989
Conference paperReading and writing of photochemical holes using gaalas diode lasers
- P. Pokrowsky
- W.E. Moerner
- et al.
- 1989
- Proceedings of SPIE 1989
Conference paperAqueous base developable deep uv resist systems based on novel monomeric and polymeric dissolution inhibitors
- Hiroshi Ito
- 1989
- Proceedings of SPIE 1989
Conference paperAqueous developable, negative working resist made of chlorinated novolac resin
- H. Hiraoka
- A.M. Patlach
- et al.
- 1989
- Proceedings of SPIE 1989
Conference paperSoft vacuum pulsed electron beam processing of teflon and teflon-like films
- J. Krishnaswamy
- G.J. Collins
- et al.
- 1989
- Proceedings of SPIE 1989
Conference paperFilters for soft x-ray solar telescopes
- Eberhard Spiller
- Kurt Grebe
- et al.
- 1989
- Proceedings of SPIE 1989
Conference paperA double crystal multilayer x-ray monochromator
- L. Golub
- A. Quillen
- et al.
- 1989
- Proceedings of SPIE 1989
Conference paper