Direct determination of photoresist composition changes during UV exposure
- Frances A. Houle
- Vaughn R. Deline
- et al.
- 2006
- SPIE Advanced Lithography 2006
Conference paper
Publications
24864 results for Exploratory Science
Adhesion between template materials and UV-cured nanoimprint resists
- Frances A. Houle
- Eric Guyer
- et al.
- 2006
- SPIE Advanced Lithography 2006
Conference paperPhase calibration for attenuating phase-shift masks
- Michael S. Hibbs
- Timothy A. Brunner
- 2006
- SPIE Advanced Lithography 2006
Conference paperNumerical analyses of the roles of gas phase and liquid phase UV photochemistry in conventional and immersion 193 nm lithography
- William Hinsberg
- Frances A. Houle
- 2006
- SPIE Advanced Lithography 2006
Conference paperInvestigation of the current resolution limits of advanced extreme ultraviolet (EUV) resists
- Patrick P. Naulleau
- Clemens Rammeloo
- et al.
- 2006
- SPIE Advanced Lithography 2006
Conference paperCharacterization of Across-device Linewidth Variation (ADLV) for 65 nm logic SRAM using CDSEM and linewidth roughness algorithms
- W. Chu
- C. Radens
- et al.
- 2006
- SPIE Advanced Lithography 2006
Conference paperSilicon containing polymer in applications for 193 nm high NA lithography processes
- Scan Bums
- Dirk Pfeiffer
- et al.
- 2006
- SPIE Advanced Lithography 2006
Conference paperVinyl ether resist system for UV-cured nanoimprint lithography
- Hiroshi Ito
- Frances A. Houle
- et al.
- 2006
- SPIE Advanced Lithography 2006
Conference paperA year in the life of an immersion lithography alpha tool at albany NanoTech
- Michael Tittnich
- John Hartley
- et al.
- 2006
- SPIE Advanced Lithography 2006
Conference paperOrganic nonlinear Kerr materials in fabry-perot cavities for all optical switching
- Nikola Moll
- Selim Jochim
- et al.
- 2006
- SPIE IOPTO 2006
Conference paper