Reactivity of a fluorine passivated silicon surface
- Ruud A. Haring
- Michael Liehr
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Conference paper
Publications
14466 results for Physical Sciences
C-H bond activation on metals: A quantum dynamics model of direct and precursor mediated dissociation
- A.C. Luntz
- J. Harris
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Conference paperInitial stage oxidation of the Ge:Si(111)-(5×5) and Ge:Si(111)-(7X7) surfaces
- R. Cao
- F. Bozso
- et al.
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Conference paperMoisture-induced interfacial oxidation of chromium on polyimide
- B.K. Furman
- H.M. Clearfield
- et al.
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Conference paperStudy particle emission in vacuum from film deposits
- Joseph S. Logan
- James J. McGill
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Conference paperAtomic layer epitaxy of silicon by dichlorosilane studied with core level spectroscopy
- J.A. Yarmoff
- D.K. Shuh
- et al.
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Conference paperTemperature optimization in an azimuthally symmetric single-wafer chemical vapor deposition reactor: The low pressure regime
- David E. Kotecki
- Steven G. Barbee
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Conference paperDry surface cleaning in integrated vacuum reactive ion etching processes
- Andrie S. Yapsir
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Conference paperSurface damage threshold of Si and Si02 in electron-cyclotron-resonance plasmas
- Young H. Lee
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Conference paperAtmospheric pressure chemical vapor deposition of Si and SiGe at low temperatures
- T.O. Sedgwick
- P. Agnello
- 1992
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Conference paper