The Ion Sensitivity of Boron Implanted Silicon Nitride Chemical SensorsYin HuMarvin H. White2019JESPaper
Computer Simulation of Oxygen Segregation in CZ/MCZ Silicon Crystals and Comparison with Experimental ResultsW.E. Langlois2019JESPaper
Calculation of Galvanic Currents and Potentials Using a p-Type Finite Element MethodR.B. Morris2019JESPaper
Chemical Vapor Deposition of Epitaxial Silicon from Silane at Low Temperatures: I. Very Low Pressure DepositionJames H. ComfortRafael Reif2019JESPaper
Reactive ion Etching of Silicon and Silicon Dioxide in CF4 Plasmas Containing H2 or C2F4 AdditivesJ.P. Simko2019JESPaper
Initiation of electroless copper plating using Pd+2/poly(acrylic acid) filmsRobert L. Jackson2019JESPaper
Hexachlorodisilane as a Precursor in the LPCVD of Silicon Dioxide and Silicon Oxynitride FilmsR.C. TaylorB.A. Scott2019JESPaper