Silicon IP reuse standards for design for manufacturability
- Juan Antonio Carballo
- Savithri Sundareswaran
- 2006
- SPIE Advanced Lithography 2006
Conference paper
Publications
25371 results for Science
Global optimization of the illumination distribution to maximize integrated process window
- Alan E. Rosenbluth
- Nakgeuon Seong
- 2006
- SPIE Advanced Lithography 2006
Conference paperLithography process optimization using linear superposition of commonly available illumination modes
- Michael M. Crouse
- Yasri Yudhistira
- et al.
- 2006
- SPIE Advanced Lithography 2006
Conference paperCharacterization of imaging performance for immersion lithography at NA=0.93
- Dario Gil
- Jaione Tirapu-Azpiroz
- et al.
- 2006
- SPIE Advanced Lithography 2006
Conference paperDFM requirements and solution roadmaps: The multi-layer approach
- Juan Antonio Carballo
- Sani Nassif
- 2006
- SPIE Advanced Lithography 2006
Conference paperOrganic nonlinear Kerr materials in fabry-perot cavities for all optical switching
- Nikola Moll
- Selim Jochim
- et al.
- 2006
- SPIE IOPTO 2006
Conference paperDissolution fundamentals of 193-nm methacrylate based photoresists
- Ashwin Rao
- Shuhui Kang
- et al.
- 2006
- SPIE Advanced Lithography 2006
Conference paperSilicon containing polymer in applications for 193 nm high NA lithography processes
- Scan Bums
- Dirk Pfeiffer
- et al.
- 2006
- SPIE Advanced Lithography 2006
Conference paperAdhesion between template materials and UV-cured nanoimprint resists
- Frances A. Houle
- Eric Guyer
- et al.
- 2006
- SPIE Advanced Lithography 2006
Conference paperSelf assembly in semiconductor microelectronics: Self-aligned sub-lithographic patterning using diblock copolymer thin films
- C.T. Black
- R. Ruiz
- 2006
- SPIE Advanced Lithography 2006
Conference paper