Publications

26885 results for Science

The effect of photoresist/topcoat properties on defect formation in immersion lithography
- - G.M. Wallraff
  - Carl E. Larson
  - et al.
- 2007
- Proceedings of SPIE 2007
Conference paper
Impact of curing kinetics and materials properties on imprint characteristics of resists for UV nanoimprint lithography
- - Frances A. Houle
  - Ann Fornof
  - et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paper
Distinguishing dose, focus and blur for lithography characterization and control
- - Christopher P. Ausschnitt
  - Timothy A. Brunner
- 2007
- SPIE Advanced Lithography 2007
Conference paper
Future directions for CMOS device technology development from a system application perspective
- - Tak H. Ning
- 2007
- SPIE Advanced Lithography 2007
Conference paper
A solid-state 193 nm laser with high spatial coherence for sub-40 nm interferometric immersion lithography
- - Andrew J. Merriam
  - Donald S. Bethune
  - et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paper
High performance 193nm photoresists based on fluorosulfonamide
- - Wenjie Li
  - Kuang-Jung Chen
  - et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paper
OPC model data collection for 45nm technology node using automatic CD-SEM offline recipe creation
- - Daniel Fischer
  - Mohamed Talbi
  - et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paper
Use of starburst patterns in optical lithography
- - M. Burkhardt
  - Cyrus Tabery
- 2007
- SPIE Advanced Lithography 2007
Conference paper
Dark field Double Dipole Lithography (DDL) for back-end-of-line processes
- - M. Burkhardt
  - Sean Burns
  - et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paper
Setting MRC rules: Balancing inspection capabilities, defect sensitivity and OPC
- - Ian Stobert
  - James Bruce
  - et al.
- 2007
- SPIE Advanced Lithography 2007
Conference paper