Characterization of vinyl ether UV-cure nanoimprint resist
- Taiichi Furukawa
- Frances A. Houle
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paper
Publications
3606 results for Mathematical Sciences
Exposure tool settings and OPC strategies for EUV Lithography at the 16nm node
- Yunfei Deng
- Jongwook Kye
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paperFlare evaluation of ASML alpha demo tool
- Hiroyuki Mizuno
- Gregory McIntyre
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paperModeling and experiments of non-telecentric thick mask effects for EUV lithography
- Gregory McIntyre
- Chiew-Seng Koay
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paperConditional probability tree estimation analysis and algorithms
- Alina Beygelzimer
- John Langford
- et al.
- 2009
- UAI 2009
Conference paperParameter-specific electronic measurement and analysis of sources of variation using ring oscillators
- Lynn T.-N. Wang
- Liang-Teck Panga
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paperCompensating non-optical effects using electrically-driven optical proximity correction
- Shayak Banerjee
- Kanak B. Agarwal
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paperFlexible optical interconnects based on silicon-containing polymers
- Ed Anzures
- Roger Dangel
- et al.
- 2009
- SPIE OPTO 2009
Conference paperCommunication technologies for exascale systems
- J.A. Kash
- P. Pepeljugoski
- et al.
- 2009
- SPIE OPTO 2009
Conference paperModeling and simulation of transistor performance shift under pattern-dependent RTA process
- Yun Ye
- Frank Liu
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paper