Mesoscale modeling for SFIL simulating polymerization kinetics and densification
- Ryan L. Burns
- Stephen C. Johnson
- et al.
- 2004
- Microlithography 2004
Conference paper
Publications
24864 results for Exploratory Science
Measurements of water distribution in thin lithographic films
- Bryan D. Vogt
- Christopher L. Soles
- et al.
- 2004
- Microlithography 2004
Conference paperOptimized acid release underlayers for 157 nm lithography
- Carl E. Larson
- G.M. Wallraff
- et al.
- 2004
- Microlithography 2004
Conference paperRinse additives for line edge roughness control in 193 nm lithography
- Dario L. Goldfarb
- Sean D. Burns
- et al.
- 2004
- Microlithography 2004
Conference paperDeep-UV immersion interferometric lithography
- Alex K. Raub
- A. Frauenglass
- et al.
- 2004
- SPIE Advanced Lithography 2004
Conference paperIBM-JSR 193nm negative tone resist: Polymer design, material properties, and lithographic performance
- Kaushal Patel
- Margaret Lawson
- et al.
- 2004
- Microlithography 2004
Conference paperSurface and bulk chemistry of chemically amplified photoresists: Segregation in thin films and environmental stability issues
- Erin L. Jablonski
- Vivek M. Prabhu
- et al.
- 2004
- Microlithography 2004
Conference paperRinse additives for defect suppression in 193 nm and 248 nm lithography
- Spyridon Skordas
- Ryan L. Burns
- et al.
- 2004
- Microlithography 2004
Conference paperHigh speed, lateral PIN photodiodes in silicon technologies
- Jeremy D. Schaub
- Steven J. Koester
- et al.
- 2004
- SPIE IOPTO 2004
Conference paperMining and knowledge discovery from the web
- Kevin S. McCurley
- Andrew Tomkins
- 2004
- I-SPAN 2004
Conference paper