Organosilicon polymers for lithographic applications
- J.M. Shaw
- M. Hatzakis
- et al.
- 2004
- Polymer Engineering & Science
Paper
Publications
24906 results for Exploratory Science
Recent advances in the photodecomposition mechanisms of diazo‐oxides
- J. Pacansky
- 2004
- Polymer Engineering & Science
PaperChemical amplification in the design of dry developing resist materials
- Hiroshi Ito
- C. Grant Willson
- 2004
- Polymer Engineering & Science
PaperStress development in supported polymer films during thermal cycling
- Ho-Ming Tong
- C.-K. Hu
- et al.
- 2004
- Polymer Engineering & Science
PaperPhotochemical free‐volume generation in poly(methyl methacrylate) photoresists
- William Limm
- Mitchell A. Winnik
- et al.
- 2004
- Polymer Engineering & Science
PaperDissolution dynamics of some polymers: Solvent‐polymer boundaries
- A.C. Ouano
- J.A. Carothers
- 2004
- Polymer Engineering & Science
PaperDesign of a positive resist for projection lithography in the mid‐UV
- Grant Willson
- Robert Miller
- et al.
- 2004
- Polymer Engineering & Science
PaperStudies of deformation-induced texture development in sheet materials using diffraction techniques
- S.W. Banovic
- M.D. Vaudin
- et al.
- 2004
- Materials Science and Engineering: A
PaperEpoxy resins for deep UV lithography
- K.J. Stewart
- M. Hatzakis
- et al.
- 2004
- Polymer Engineering & Science
PaperUltrafast deep UV lithography using excimer lasers
- K. Jain
- S. Rice
- et al.
- 2004
- Polymer Engineering & Science
Paper