Rise of chemical amplification resists from laboratory curiosity to paradigm enabling Moore's law
- Hiroshi Ito
- 2008
- SPIE Advanced Lithography 2008
Publications
3599 results for Mathematical Sciences
Resist freezing process for double exposure lithography
- Kuang-Jung Rex Chen
- Wu-Song Huang
- et al.
- 2008
- SPIE Advanced Lithography 2008
A new class of low bake resists for 193-nm immersion lithography
- Ratnam Sooriyakumaran
- Richard DiPietro
- et al.
- 2008
- SPIE Advanced Lithography 2008
Lactones in 193 nm resists: What do they do?
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2008
- SPIE Advanced Lithography 2008
The halting probability via Wang tiles
- Gregory Chaitin
- 2008
- Fundamenta Informaticae
Resource constrained stream mining with classifier tree topologies
- Brian Foo
- Deepak S. Turaga
- et al.
- 2008
- IEEE SPL
Adaptive barrier update strategies for nonlinear interior methods
- Jorge Nocedal
- Andreas Wächter
- et al.
- 2008
- SIAM Journal on Optimization
Integration of polymer self-assembly for lithographic application
- Joy Y. Cheng
- Daniel P. Sanders
- et al.
- 2008
- SPIE Advanced Lithography 2008
Challenges of implementing contour modeling in 32nm technology
- Daniel Fischer
- Geng Han
- et al.
- 2008
- SPIE Advanced Lithography 2008
On-chip timing uncertainty measurements on IBM microprocessors
- R.L. Franch
- P. Restle
- et al.
- 2008
- IEEE ITC 2008