The problem of optimal placement of Sub-Resolution Assist Features (SRAF)Maharaj MukherjeeScott Mansfieldet al.2005SPIE Advanced Lithography 2005Conference paper
First microprocessors with immersion lithographyD. GilT. Baileyet al.2005SPIE Advanced Lithography 2005Conference paper
Resist blur and line edge roughnessGregg M. Gallatin2005SPIE Advanced Lithography 2005Conference paper