Particle reduction in back end of line plasma-etching process: CFM: Contamination free manufacturing
- Lijuan Zou
- Alex Vaghese
- et al.
- 2018
- ASMC 2018
Conference paper
Publications
5 results at ASMC 2018
Method of problem solving to diagnose high particle failures due to unique rotation stopping position: CFM: Contamination free manufacturing
- Jessica Gruss-Gifford
- T. Haigh
- et al.
- 2018
- ASMC 2018
Conference paperGas cluster ion beam processing for improved self aligned contact yield at 7 nm node FinFET: MJ: MOL and junction interfaces
- Su Chen Fan
- Sean Teehan
- et al.
- 2018
- ASMC 2018
Conference paperStudy of titanium nitride underlayer properties and its influence on tungsten growth
- Shanti Pancharatnam
- J. Wynne
- et al.
- 2018
- ASMC 2018
Conference paperRing oscillator yield learning methodologies for CMOS technology research
- Victor Chan
- D. Lea
- et al.
- 2018
- ASMC 2018
Conference paper