CHARACTERIZATION OF IC DEVICES FABRICATED IN LOW TEMPERATURE (550 degree C) EPITAXY BY UHV/CVD TECHNIQUE.T.N. NguyenD.L. Harameet al.1985IEDM 1985Conference paper
0. 5- mu M-CHANNEL CMOS TECHNOLOGY OPTIMIZED FOR LIQUID-NITROGEN-TEMPERATURE OPERATION.J.Y.-C. SunY. Tauret al.1985IEDM 1985Conference paper
SELF-ALIGNED PROCESSES FOR THE GaAs GATE FET.H. BaratteD.C. La Tulipeet al.1985IEDM 1985Conference paper
ON THE IMPURITY PROFILES OF DOWN SCALED BIPOLAR TRANSISTORS.D.D. TangG.P. Liet al.1985IEDM 1985Conference paper
RELIABILITY ANALYSIS OF SELF-ALIGNED BIPOLAR TRANSISTOR UNDER FORWARD ACTIVE CURRENT STRESS.T.C. ChenC. Kayaet al.1985IEDM 1985Conference paper
SELF-CONSISTENT CALCULATION OF ELECTRON STATES IN NARROW CHANNELS.S.E. LauxAlan C. Warren1985IEDM 1985Conference paper
GaAlAs/GaAs HETEROSTRUCTURE BIPOLAR TRANSISTORS: EXPERIMENT AND THEORY.S. Tiwari1985IEDM 1985Conference paper