Thermally stable ultra-thin Zr silicate for CMOS applications
- Z. Luo
- T.P. Ma
- et al.
- 2001
- International Symposium on VLSI Technology, Systems, and Applications, Proceedings
Paper
Publications
7 results at International Symposium on VLSI Technology, Systems, and Applications, Proceedings
Thickness measurement of ultra-thin gate dielectrics under inversion condition
- W. Zhu
- Mukesh Khare
- et al.
- 2001
- International Symposium on VLSI Technology, Systems, and Applications, Proceedings
PaperPractical resolution limit of KrF lithography
- Ralf Schuster
- 1999
- International Symposium on VLSI Technology, Systems, and Applications, Proceedings
PaperImplementation of a high speed multiport register file in a 1.8V, 0.25 μm CMOS bulk and SOI technology
- R.V. Joshi
- W. Hwang
- et al.
- 1999
- International Symposium on VLSI Technology, Systems, and Applications, Proceedings
PaperCMOS scaling beyond 0.1 μm: how far can it go?
- Y. Taur
- 1999
- International Symposium on VLSI Technology, Systems, and Applications, Proceedings
PaperDesign challenges for high-performance SOI digital CMOS VLSI
- C.T. Chuang
- 1999
- International Symposium on VLSI Technology, Systems, and Applications, Proceedings
PaperConversion of bulk CMOS circuits to SOI technology and its noise impact
- L.K. Wang
- Howard H. Chen
- 1999
- International Symposium on VLSI Technology, Systems, and Applications, Proceedings
Paper