Pouya Hashemi, Karthik Balakrishnan, et al.
VLSI Technology 2014
Many fabricated III-V MOSFETs have electrically thin field oxide (FOX) that leads to parasitic currents and parasitic capacitances. When extracting long-channel mobility of such devices using the conventional two-FET method, some of these parasitic components are not subtracted out. In this paper, we present a simple four-FET method for extracting long-channel mobility that works well even when the equivalent oxide thickness (EOT) of the FOX is equal to the EOT of the FET gate oxide.
Pouya Hashemi, Karthik Balakrishnan, et al.
VLSI Technology 2014
Guy M. Cohen, Amlan Majumdar, et al.
physica status solidi RRL
Xiao Sun, Christopher P. D’Emic, et al.
VLSI Technology 2017
Amlan Majumdar, Sarunya Bangsaruntip, et al.
IEDM 2012