Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Two coefficient adjustment-methods were analyzed using special ordered set (SOS) constraints. In first method, the adjustment coefficient was changed to minimum value and in second method it was changed to maximum value. The modified approach suggested the generalization of first method and correction in the second method. The results showed that correction to second method leads to inequality as does the generalization in first method.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Pradip Bose
VTS 1998
Thomas M. Cover
IEEE Trans. Inf. Theory
Yao Qi, Raja Das, et al.
ISSTA 2009