Silicon-oxynitride (SiON) for photonic integrated circuits
H. Salemink, F. Horst, et al.
Materials Research Society Symposium - Proceedings
High-quality etched mirrors for AlGaAs/GaAs power lasers for applications in optical storage have been fabricated by chemically assisted ion-beam etching. In order to ensure flat mirror facets of the ridge-waveguide lasers, a flared-waveguide end section is employed. This results in a very slight mirror roughness of ~20 nm across the beam cross section, and yields excellent beam properties allowing diffraction-limited focusing up to 50 mW output power. © 1991 IEEE
H. Salemink, F. Horst, et al.
Materials Research Society Symposium - Proceedings
David J. Webb, M. Benedict, et al.
SPIE Optics, Electro-Optics, and Laser Applications in Science and Engineering 1991
T. Morf, M. Kossel, et al.
Electronics Letters
N. Blanc, P. Guéret, et al.
Applied Physics Letters