S. Cohen, J.C. Liu, et al.
MRS Spring Meeting 1999
Paper
Dry ridge etching of AlGaAs GRINSCH lasers
Abstract
Optical confinement properties of AlGaAs GRINSCH ridge lasers are sensitive to the width and the depth of the ridge. Optimum waveguide confinement requires excellent control during the ridge etch. This paper describes a Cl2 reactive ion etching process and its associated endpoint technique which achieves such process control. © 1990.
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