Investigations of silicon nano-crystal floating gate memories
Arvind Kumar, Jeffrey J. Welser, et al.
MRS Spring 2000
Electron beam damage is a problem for low-energy electron diffraction, Auger electron spectroscopy, and electron microscopy. We have used tunneling spectroscopy to study the damage caused by 30 keV incident electrons on chemisorbed monolayer films of hexanoic acid, 2,4-hexadienoic acid, and benzoic acid. Our results on monolayer films are compared to existing work on bulk samples. Damage cross sections are similar to bulk values; molecules with more delocalized electrons are more resistant to damage. In contrast to bulk results, however, we find little if any conjugation or cross linking after irradiation. © 1977.
Arvind Kumar, Jeffrey J. Welser, et al.
MRS Spring 2000
R.J. Gambino, N.R. Stemple, et al.
Journal of Physics and Chemistry of Solids
R. Ghez, J.S. Lew
Journal of Crystal Growth
I.K. Pour, D.J. Krajnovich, et al.
SPIE Optical Materials for High Average Power Lasers 1992