Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
A large enhancement of the parametrically generated backward-propagating elastic wave in Si: In is reported. The enhancement is observed when the nonlinear interaction between microwave electric and elastic fields occurs at the interface between the Si sample and the sputtered thin-film ZnO ultrasonic transducer. Phase and spectral information is presented. No satisfactory mechanism for the enhancement is known. © 1982 The American Physical Society.
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
P.C. Pattnaik, D.M. Newns
Physical Review B
Michael Ray, Yves C. Martin
Proceedings of SPIE - The International Society for Optical Engineering