Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
We examine the effect of Co-cluster morphology on giant magnetoresistance (MR) in phase-separated Co-Cu films. The Co clusters were characterized through grazing incidence, anomalous, small-angle x-ray scattering. With thermal annealing the Co cluster diameter increases from 21 to ∼250 with a concomitant drop from ∼35% to 1% in the 4.2 K MR. The MR scales approximately as the inverse cluster size. Comparison with theory indicates that interfacial spin-dependent electron scattering is the dominant scattering mechanism underlying giant MR for cluster diameters up to at least 250. © 1993 The American Physical Society.
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
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Macromolecules
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SPIE Advances in Semiconductors and Superconductors 1990
Sang-Min Park, Mark P. Stoykovich, et al.
Advanced Materials