Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
We briefly review recent progress in elucidating the time-independent critical behavior of systems with infinite numbers of static absorbing states, and show that the critical exponent describing the decay with time of the order parameter right at the critical point is the same as that of the directed percolation problem.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Peter Wendt
Electronic Imaging: Advanced Devices and Systems 1990
G. Grinstein
Journal of Physics A: Mathematical and General
J. LaRue, C. Ting
Proceedings of SPIE 1989