Ranulfo Allen, John Baglin, et al.
J. Photopolym. Sci. Tech.
Paper
Low stress development of poly(methylmethacrylate) for high aspect ratio structures
Abstract
Magnetic head requirements for high aspect ratio pole tips were met using single-layer PMMA exposed at 100 kV. Using cooled mixtures of IPA and water and ultrasonic agitation, 14:1 aspect ratios in resist were demonstrated.
Related
Shiyi Chen, Daniel Martínez, et al.
Physics of Fluids
Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
John G. Long, Peter C. Searson, et al.
JES