Ranulfo Allen, John Baglin, et al.
J. Photopolym. Sci. Tech.
The phenomenon of metastable phase formation during a constant temperature and constant pressure thin film reaction is explained by a kinetic model emphasizing the rate of transition. It is assumed that the reaction obeys a maximum time-dependent rather than time-independent negative free energy change. The product persists in the metastable state due to a high activation barrier to later transition. © 1991.
Ranulfo Allen, John Baglin, et al.
J. Photopolym. Sci. Tech.
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MRS Fall Meeting 2020
B.A. Hutchins, T.N. Rhodin, et al.
Surface Science
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007