Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Periodic structures, that is, structures that consist of a basic pattern which is repeated multiple times, are commonplace in the electronics industry. This paper is concerned with the determination of thermal stresses in such structures. Specifically, it is demonstrated that thermal stresses can be computed using a reduced model, if one uses the correct boundary conditions. It is also shown that a reduced model can give very misleading results if incorrect boundary conditions are employed. © 1992 by ASME.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Xiaozhu Kang, Hui Zhang, et al.
ICWS 2008
Ziyang Liu, Sivaramakrishnan Natarajan, et al.
VLDB
Elena Cabrio, Philipp Cimiano, et al.
CLEF 2013