Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
The integration of a new aqueous clean, dSP+, has been demonstrated for aluminum interconnect technology in advanced DRAM products. The dSP+ chemistry was targeted for two back-end-of-line (BEOL) applications: post Al RIE clean and via clean. The results in this paper are discussed using SEM, reliability, and electrical parametric data.
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Revanth Kodoru, Atanu Saha, et al.
arXiv
Sang-Min Park, Mark P. Stoykovich, et al.
Advanced Materials
John G. Long, Peter C. Searson, et al.
JES