Patterned nanoporous poly(methylsilsesquioxane) thin films: A potential high density substrate

Patterns of thin films of nanoporous poly(methylsilsesquioxane) (PMSSQ) were generated using a lithographic method coupled with reactive ion etching. Surface hydrophilicity of the nanoporous films was modulated using a simple UV/O3 treatment. A fluorescent dye, 6-carboxyfluorescein (6-FAM), was attached using a linker, bis(hydroxyethyl) aminopropyltriethoxysilane (HE-APTS), to the patterns. An approximately 10 × increase in the green light intensity in the porous regions relative to flat silicon wafer surface was observed, which suggests that the patterned nanoporous PMSSQ thin film has a potential as a high density substrate for tethering bioprobe molecules. © 2003 Elsevier B.V. All rights reserved.