Applied Spectroscopy Reviews

Paper

05 Dec 2006

Plasma Sources in Analytical Mass Spectrometry

View publication

Abstract

No abstract available.

Paper

Ion- and electron-assisted gas-surface chemistry - An important effect in plasma etching

J.W. Coburn, Harold F. Winters

Journal of Applied Physics

Paper

Effect of ion bombardment on the plasma-assisted etching and deposition of plasma perfluoropolymer thin films

F. Fracassi, E. Occhiello, et al.

Journal of Applied Physics

Paper

Electron-beam effects in depth profiling measurements with Auger electron spectroscopy

J. Ahn, C.R. Perleberg, et al.

Journal of Applied Physics

Conference paper

Surface processes in plasma-assisted etching

J.W. Coburn

Symposium on Process Physics and Modeling in Semiconductor Technology 1990

View all publications