Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
No abstract available.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Harpreet S. Sawhney
IS&T/SPIE Electronic Imaging 1994
Heinz Koeppl, Marc Hafner, et al.
BMC Bioinformatics
Igor Devetak, Andreas Winter
ISIT 2003