A. Diaz, M. Baier, et al.
JES
We present a method of resolving the nuclear and electronic contributions to the third-order susceptibility χ3 in a phase conjugation experiment. The technique is applied to octylmethylpolysilane yielding χ3 (electronic)=(1.8±0.5)×10-12 esu and χ3(nuclear)=(1.1±0.4) ×10-12 esu at 532 nm.
A. Diaz, M. Baier, et al.
JES
Hiroshi Ito, G.M. Wallraff, et al.
International Conference on Microprocesses and Nanotechnology 2001
G.M. Wallraff, Carl E. Larson, et al.
Proceedings of SPIE-The International Society for Optical Engineering
G.M. Wallraff, W.D. Hinsberg, et al.
Microlithography 1995