F.A. Houle, W.D. Hinsberg, et al.
ACS Spring 1999
We present a method of resolving the nuclear and electronic contributions to the third-order susceptibility χ3 in a phase conjugation experiment. The technique is applied to octylmethylpolysilane yielding χ3 (electronic)=(1.8±0.5)×10-12 esu and χ3(nuclear)=(1.1±0.4) ×10-12 esu at 532 nm.
F.A. Houle, W.D. Hinsberg, et al.
ACS Spring 1999
G.M. Wallraff, D. Medeiros, et al.
Microlithography 2005
F.A. Houle, W.D. Hinsberg, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
R.D. Allen, G.M. Wallraff, et al.
ACS Spring 1991