Solid phase van der Waals epitaxy of PtCoO₂ on fluorphlogopite mica by plasma enhanced atomic layer deposition

$PtCoO{_₂}$, a metallic delafossite oxide, has recently garnered significant research interest due to its exceptional electrical conductivity, particularly in thin film geometry. Its potential as a replacement for copper in nanoscale interconnects has made it a compelling candidate for next-generation electronic applications. In this work, we demonstrate the growth of $PtCoO{_₂}$ thin films on various substrates using plasma-enhanced atomic layer deposition. Through optimized post-deposition annealing, we achieve solid phase van der Waals epitaxy of $PtCoO{_₂}$ on fluorophlogopite mica. X-ray diffraction measurements reveal a pronounced (00l) out-of-plane texture, indicating strong crystallographic alignment. The successful epitaxial growth on F-mica not only confirms the viability of our approach but also highlights the potential of $PtCoO{_₂}$ for use in flexible electronic devices.