R.D. Murphy, R.O. Watts
Journal of Low Temperature Physics
Paper
Summary Abstract: The origin of oxidation induced enhancement of Si+ sputter yield in SIMS
Abstract
No abstract available.
Related
A.B. McLean, R.H. Williams
Journal of Physics C: Solid State Physics
Mark W. Dowley
Solid State Communications
A. Gangulee, F.M. D'Heurle
Thin Solid Films