Top surface imaging systems utilizing poly(vinylbenzoic acid) and its ester

Poly(p-vinylbenzoic acid) and its ester are opaque below 300 nm and therefore useful in deep UV top surface imaging (TSI), which is a viable technique to overcome the shallow depth of focus and topography effects. In this paper are described two TSI systems utilizing the benzoic acid derivatives in the chemical amplification scheme. The first system is a single-layer negative TSI based on gas-phase silylation of poly(t-butyl p-vinylbenzoate) resist. The second case is the use of poly(p-vinylbenzoic acid) as a strippable bottom layer in conjunction with a thermally-developable, oxygen RIE barrier resist, which comprises an all-dry bilayer, positive TSI system. © 1992, The Society of Photopolymer Science and Technology(SPST). All rights reserved.