Lattice imaging of metastable TiSi2
- T.C. Chou
- C.Y. Wong
- et al.
- 1987
- Journal of Applied Physics
Paper
Publications
34 results for C.Y. Wong
Enhanced grain growth of phosphorus-doped polycrystalline silicon by titanium silicide formation
- T.C. Chou
- C.Y. Wong
- et al.
- 1986
- Applied Physics Letters
PaperCross-sectional transmission electron microscopy investigation of Ti/Si reaction on phosphorus-doped polycrystalline silicon gate
- C.Y. Wong
- F.S. Lai
- et al.
- 1986
- Journal of Applied Physics
PaperX-ray photoelectron spectroscopy on surface oxidation of silicon by some cleaning procedures
- C.Y. Wong
- S. Klepner
- 1986
- Applied Physics Letters
PaperAmbient and dopant effects on boron diffusion in oxides
- C.Y. Wong
- F.S. Lai
- 1986
- Applied Physics Letters
PaperThermal stability of TiSi2 on mono- and polycrystalline silicon
- C.Y. Wong
- L.K. Wang
- et al.
- 1986
- Journal of Applied Physics
PaperEffect of arsenic segregation on the electrical properties of grain boundaries in polycrystalline silicon
- C.Y. Wong
- C.R.M. Grovenor
- et al.
- 1985
- Journal of Applied Physics
PaperArsenic segregation to silicon/silicon oxide interfaces
- C.Y. Wong
- C.R.M. Grovenor
- et al.
- 1985
- Journal of Applied Physics
PaperPOLYSILICON EMITTER RESISTANCE AND CARRIER TRANSPORT STUDIES.
- J.M.C. Stork
- C.Y. Wong
- et al.
- 1984
- VLSI Technology 1984
Conference paperCorrelation Between the Diffusive and Electrical Barrier Properties of the Interface in Polysilicon Contacted n+-p Junctions
- Johannes M.C. Stork
- Maurizio Arienzo
- et al.
- 1985
- IEEE T-ED
Paper