INTERACTION BETWEEN Ti AND SiO//2.
- C.-Y. Ting
- M. Wittmer
- et al.
- 1983
- ECS Meeting 1983
Conference paper
Publications
46 results for M. Wittmer
INTERACTION BETWEEN Ti AND SiO//2.
- C.-Y. Ting
- M. Wittmer
- et al.
- 1983
- VLSI Science and Technology 1983
Conference paperLow-temperature diffusion of dopant atoms in silicon during interfacial silicide formation
- M. Wittmer
- K.N. Tu
- 1984
- Physical Review B
PaperBarrier Layers: Principles and applications in microelectronics
- Marc Wittmer
- 1984
- JVSTA
PaperGrowth kinetics of platinum silicide
- Marc Wittmer
- 1983
- Journal of Applied Physics
PaperInvestigation of the Al/TiSi2/Si contact system
- Chung Yu Ting
- Marc Wittmer
- 1983
- Journal of Applied Physics
PaperReduction of contact resistivity by As redistribution during Pd 2Si formation
- I. Ohdomari
- M. Hori
- et al.
- 1983
- Journal of Applied Physics
PaperRedistribution of As during Pd2Si formation: Electrical measurements
- M. Wittmer
- C.-Y. Ting
- et al.
- 1983
- Journal of Applied Physics
PaperSilicide contacts for shallow junction devices
- Marc Wittmer
- 1983
- Thin Solid Films
PaperInvestigation of Tin films reactively sputtered using a sputter gun
- K.Y. Ahn
- M. Wittmer
- et al.
- 1983
- Thin Solid Films
Paper