Lithographic Process Optimization for Next-Generation Advanced Packaging Influenced by Wafer Topography and Reticle StitchingChris BottomsSarah Nahar Chowdhuryet al.2026SPIE Advanced Lithography + Patterning 2026Conference paper
Multi-reticle stitching: Applications from packaging to High-NA EUVChris BottomsRick Johnsonet al.2025SPIE Advanced Lithography + Patterning 2025Conference paper
Large Feature Wafer Level In-Line Optical Metrology Techniques for Advanced Packaging SchemesKatherine SiegChris Bottomset al.2024SPIE Advanced Lithography + Patterning 2024Conference paper