NanoStack Transistor Architecture for CMOS 7A Node and Beyond
- S. Reboh
- C. Zhang
- et al.
- 2025
- VLSI Technology and Circuits 2025
Conference paper
Publications
20 results for J. Strane
Manufacturing Yield Improvement for Advanced CMOS Technology Middle-of-Line Interconnect with Cobalt Metallization : YE: YieldEnhancement/Learning
- Susan Fan
- P. Jamison
- et al.
- 2023
- ASMC 2023
Conference paperVertical-Transport Nanosheet Technology for CMOS Scaling beyond Lateral-Transport Devices
- H. Jagannathan
- B. Anderson
- et al.
- 2021
- IEDM 2021
Conference paperMiddle of Line (MOL) Process Investigation in Ring Oscillator failure
- Victor Chan
- M. Bergendahl
- et al.
- 2020
- ASMC 2020
Conference paperYield learning methodologies and failure isolation in ring oscillator circuit for CMOS technology research
- Victor Chan
- Kangguo Cheng
- et al.
- 2019
- IEEE Trans Semicond Manuf
PaperFailure isolation in ring oscillator circuit and defect detection in CMOS technology research
- Victor Chan
- M. Bergendahl
- et al.
- 2019
- ASMC 2019
Conference paperParasitic Resistance Reduction Strategies for Advanced CMOS FinFETs beyond 7nm
- Heng Wu
- Oleg Gluschenkov
- et al.
- 2018
- IEDM 2018
Conference paperIntegrated dual SPE processes with low contact resistivity for future CMOS technologies
- Heng Wu
- Soon-Cheon Seo
- et al.
- 2017
- IEDM 2017
Conference paperTechnology viable DC performance elements for Si/SiGe channel CMOS FinFTT
- G. Tsutsui
- Ruqiang Bao
- et al.
- 2016
- IEDM 2016
Conference paperFINFET technology featuring high mobility SiGe channel for 10nm and beyond
- Dechao Guo
- G. Karve
- et al.
- 2016
- VLSI Technology 2016
Conference paper