Measuring Contact Hole Distributions for Use in Predicting Missing Contact Hole RatesElisa NovelliChris A. Macket al.2026SPIE Advanced Lithography + Patterning 2026Conference paper
Exploring the Limits of Contact Hole Patterning with High NA EUV LithographyDario GoldfarbZheng Chenet al.2026SPIE Advanced Lithography + Patterning 2026Talk
Massive E-beam Metrology Characterization of Reticle Stitching BoundariesGenevieve KaneConnor Smithet al.2025SPIE Advanced Lithography + Patterning 2025Talk