Lithographic Process Optimization for Next-Generation Advanced Packaging Influenced by Wafer Topography and Reticle StitchingChris BottomsSarah Nahar Chowdhuryet al.2026SPIE Advanced Lithography + Patterning 2026Conference paper
Multi-reticle stitching: Applications from packaging to High-NA EUVChris BottomsRick Johnsonet al.2025SPIE Advanced Lithography + Patterning 2025Conference paper