In situ study of the formation of silicide phases in amorphous Co-Si mixed layers
- C. Van Bockstael
- K. De Keyser
- et al.
- 2010
- Microelectronic Engineering
Paper
Publications
204 results for Christian Lavoie
Morphological stability and specific resistivity of sub-10 nm silicide films of Ni1-x Ptx on Si substrate
- Zhen Zhang
- Shi Li Zhang
- et al.
- 2010
- Applied Physics Letters
PaperTrigate 6T SRAM scaling to 0.06 μm2
- M. Guillorn
- J. Chang
- et al.
- 2009
- IEDM 2009
Conference paperIn situ x-ray diffraction study of Ni-Yb interlayer and alloy systems on Si(100)
- W. Knaepen
- J. Demeulemeester
- et al.
- 2009
- JVSTA
PaperCopper contact metallization using Ru-based barrier liners for 45 nm and 32 nm nodes: Reliability and device performance
- Soon-Cheon Seo
- Chih-Chao Yang
- et al.
- 2008
- ADMETA 2008
Conference paperStress determination in nickel monosilicide films using x-ray diffraction
- Conal E. Murray
- Zhen Zhang
- et al.
- 2009
- Journal of Applied Physics
PaperIn situ study of the formation of silicide phases in amorphous Ni-Si mixed layers
- C. Van Bockstael
- C. Detavernier
- et al.
- 2009
- Journal of Applied Physics
PaperControlling nickel silicide phase formation by Si implantation damage
- M. Guihard
- P. Turcotte-Tremblay
- et al.
- 2009
- Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
PaperIn situ x-ray diffraction study of metal induced crystallization of amorphous germanium
- W. Knaepen
- S. Gaudet
- et al.
- 2009
- Journal of Applied Physics
PaperInfluence of a transient hexagonal phase on the microstructure and morphological stability of NiSi films
- C. Van Bockstael
- K. De Keyser
- et al.
- 2009
- Applied Physics Letters
Paper