Kinetics of agglomeration of NiSi and NiSi2 phase formation
- C. Detavernier
- A.S. Özcan
- et al.
- 2002
- MRS Proceedings 2002
Conference paper
Publications
204 results for Christian Lavoie
Metal-gate FinFET and fully-depleted SOI devices using total gate silicidation
- Jakub Kedzierski
- Edward Nowak
- et al.
- 2002
- IEDM 2002
Conference paperInfluence of substrate temperature during sputter deposition on the subsequent formation of titanium disilicide
- A.S. Özean
- K.F. Ludwig Jr.
- et al.
- 2002
- MRS Proceedings 2002
Conference paperPerformance enhancement on sub-70 nm strained silicon SOI MOSFETS on ultra-thin thermally mixed strained silicon/SiGe on insulator(TM-SGOI) substrate with raised S/D
- B.H. Lee
- A.C. Mocuta
- et al.
- 2002
- IEDM 2002
Conference paperTexture formation in Ti-Ta alloy disilicide thin films
- A.S. Özcan
- K.F. Ludwig Jr.
- et al.
- 2002
- Journal of Applied Physics
PaperNucleation and growth kinetics of preferred C54 TiSi 2 orientations: Time-resolved x-ray diffraction measurements
- A.S. Özcan
- K.F. Ludwig Jr.
- et al.
- 2002
- Journal of Applied Physics
PaperTexture of TiSi 2 thin films on Si (001)
- A.S. Özcan
- K.F. Ludwig Jr.
- et al.
- 2002
- Journal of Applied Physics
PaperDiffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
- H. Kim
- C. Cabral
- et al.
- 2002
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperMetastable and equilibrium phase formation in sputter-deposited Ti/Al multilayer thin films
- G.A. Lucadamo
- K. Barmak
- et al.
- 2002
- Journal of Applied Physics
PaperIn-situ studies of silicide formation in Ti-Ta bilayer thin films on poly-Si
- A.S. Özcan
- K.F. Ludwig Jr.
- et al.
- 2002
- MRS Proceedings 2002
Conference paper