Design technology co-optimization assessment for directed self-Assembly-based lithography: Design for directed self-Assembly or directed self-Assembly for design
- Kafai Lai
- Chi Chun Liu
- et al.
- 2017
- J. Micro/Nanolithogr. MEMS MOEMS
Paper
Publications
14 results for Todd Bailey
Methodology for determining critical dimension scanning electron microscope measurement condition of sub-20 nm resist patterns for 0.33 NA extreme ultraviolet lithography
- Nobuhiro Okai
- Erin Lavigne
- et al.
- 2016
- J. Micro/Nanolithogr. MEMS MOEMS
PaperLithographic qualification of high-Transmission mask blank for 10nm node and beyond
- Yongan Xu
- Tom Faure
- et al.
- 2016
- SPIE Advanced Lithography 2016
Conference paperMachine learning and predictive data analytics enabling metrology and process control in IC fabrication
- Narender Rana
- Yunlin Zhang
- et al.
- 2015
- SPIE Advanced Lithography 2015
Conference paperScatterometry-based defect detection for DSA in-line process control
- Robin Chao
- Chi Chun Liu
- et al.
- 2015
- SPIE Advanced Lithography 2015
Conference paperMethodology for determining CD-SEM measurement condition of sub-20nm resist patterns for 0.33NA EUV lithography
- Nobuhiro Okai
- Erin Lavigne
- et al.
- 2015
- SPIE Advanced Lithography 2015
Conference paperMultitechnique metrology methods for evaluating pitch walking in 14 nm and beyond FinFETs
- Robin Chao
- Kriti K. Kohli
- et al.
- 2014
- J. Micro/Nanolithogr. MEMS MOEMS
PaperLeveraging advanced data analytics, machine learning, and metrology models to enable critical dimension metrology solutions for advanced integrated circuit nodes
- Narender Rana
- Yunlin Zhang
- et al.
- 2014
- J. Micro/Nanolithogr. MEMS MOEMS
PaperNovel in-line metrology methods for Fin pitch walking monitoring in 14nm node and beyond
- Robin Chao
- Kriti Kohli
- et al.
- 2014
- SPIE Advanced Lithography 2014
Conference paperLeveraging data analytics, patterning simulations and metrology models to enhance CD metrology accuracy for advanced IC nodes
- Narender Rana
- Yunlin Zhang
- et al.
- 2014
- SPIE Advanced Lithography 2014
Conference paper