Control of sidewall roughness formation in through-silicon via etch at non-cryogenic temperatures
- John M. Papalia
- Devi Koty
- et al.
- 2022
- SPIE Advanced Lithography 2022
Conference paper
Publications
15 results for J. M. Papalia
Plasma processing for advanced microelectronics beyond CMOS
- Nathan Marchack
- L. Buzi
- et al.
- 2021
- Journal of Applied Physics
ReviewAdvancements in Throughput, Lifetime, Purification, and Workflow for Integrated Nanoscale Deterministic Lateral Displacement
- Benjamin Wunsch
- Kuan Yu Hsieh
- et al.
- 2021
- Advanced Materials Technologies
PaperMushroom-Type phase change memory with projection liner: An array-level demonstration of conductance drift and noise mitigation
- Robert L. Bruce
- Syed Ghazi Sarwat
- et al.
- 2021
- IRPS 2021
Conference paperEffect of surface temperature on GeSbTe damage formation during plasma processing
- L. Buzi
- J. M. Papalia
- et al.
- 2021
- SPIE Advanced Lithography 2021
Conference paperProcess trace analytics for process development
- Robert J. Baseman
- Fateh A. Tipu
- et al.
- 2021
- SPIE Advanced Lithography 2021
Conference paperUtilizing photosensitive polymers to evaluate UV radiation exposures in different plasma chamber configurations
- L. Buzi
- Hiroyuki Miyazoe
- et al.
- 2020
- JVSTA
PaperHydrocarbon layer formation and removal studies on SiN films etched in halogen/hydrofluorocarbon plasmas
- L. Buzi
- J. M. Papalia
- et al.
- 2020
- SPIE Advanced Lithography 2020
Conference paperComprehensive Scaling Study on 3D Cross-Point PCM toward 1Znm Node for SCM Applications
- W. Chien
- H. Ho
- et al.
- 2019
- VLSI Technology 2019
Conference paperSuperb endurance and appropriate Vth of PCM pillar cell using buffer layer for 3D cross-point memory
- N. Gang
- W. Chien
- et al.
- 2019
- IMW 2019
Conference paper