Lithographic Process Optimization for Next-Generation Advanced Packaging Influenced by Wafer Topography and Reticle StitchingChris BottomsSarah Nahar Chowdhuryet al.2026SPIE Advanced Lithography + Patterning 2026Conference paper
D2W and W2W Hybrid bonding system with below 2.5 micron pitch for 3D chiplet AI applicationsKatsuyuki SakumaRoy Yuet al.2024IEDM 2024Invited talk