The Schottky emission effect: A critical examination of a century-old model
- Ernest Y. Wu
- Baozhen Li
- 2022
- Journal of Applied Physics
Paper
Publications
64 results for Ernest Y. Wu
Gibbs spatial process for characterization of filament interaction in ReRAM devices via photon emission microscopy
- Ernest Wu
- Franco Stellari
- et al.
- 2022
- Applied Physics Letters
PaperA Flexible and Inherently Self-Consistent Methodology for MOL/BEOL/MIMCAP TDDB Applications with Excessive Variability-Induced Degradation
- Ernest Wu
- Ron Bolam
- et al.
- 2022
- IRPS 2022
Conference paperQuantum Mechanical Connection of Schottky Emission Process and Its implications on Breakdown Methodology and Conduction Modeling for BEOL Low-k Dielectrics
- Ernest Wu
- Baozhen Li
- 2022
- IRPS 2022
Conference paperResistive Random Access Memory Filament Visualization and Characterization Using Photon Emission Microscopy
- Franco Stellari
- Ernest Y. Wu
- et al.
- 2021
- IEEE Electron Device Letters
PaperResistive Memory Process Optimization for High Resistance Switching Toward Scalable Analog Compute Technology for Deep Learning
- Youngseok Kim
- Soon-Cheon Seo
- et al.
- 2021
- IEEE Electron Device Letters
PaperTDDB Reliability in Gate-All-Around Nanosheet
- Huimei Zhou
- Miaomiao Wang
- et al.
- 2021
- IRPS 2021
Conference paperFundamental roles of extreme-value distributions in dielectric breakdown and memory applications (minimum-value versus maximum-value statistics)
- Ernest Wu
- Takashi Ando
- et al.
- 2020
- Japanese Journal of Applied Physics
PaperA maximum extreme-value distribution model for switching conductance of oxide-RRAM in memory applications
- Ernest Wu
- Takashi Ando
- et al.
- 2020
- Applied Physics Letters
PaperFacts and Myths of Dielectric Breakdown Processes-Part II: Post-Breakdown and Variability
- Ernest Y. Wu
- 2019
- IEEE T-ED
Paper