Single-step deep reactive ion etch of silicon for through-via applications with alternative gas mixtures
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- 2025
- Journal of Vacuum Science and Technology A Vacuum Surfaces and Films
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- Chemistry of Materials
PaperEtching of iridium thin films in chlorine- and fluorine-based inductively coupled plasmas
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- 2024
- SPIE Advanced Lithography 2024
Conference paperDisorder-Induced Magnetotransport Anomalies in Amorphous and Textured Co1- xSix Semimetal Thin Films
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- 2023
- ACS Applied Electronic Materials
PaperCharacterization of TSV etch from a sustainability standpoint
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- Nathan Marchack
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- 2023
- SPIE Advanced Lithography 2023
Conference paperNew Phase-Change Materials by Atomic-Level Engineering the Dopants for Extremely Low VthDrift at 85 °C and High Endurance 3D Crosspoint Memory : IBM/Macronix PCRAM Joint Project
- Huai-Yu Cheng
- A. Grun
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- IEDM 2022
Conference paperStudy of surface interactions for encapsulation of phase change memory materials
- L. Buzi
- D. Koty
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- SPIE Advanced Lithography 2022
Conference paperProcess-Induced ReRAM Performance Improvement of Atomic Layer Deposited HfO2 for Analog In-Memory Computing Applications
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- H. Higuchi
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- 2021
- IMCS 2021
Conference paperAtomic Layer Deposition of Tungsten Oxide Using Nitrogen Dioxide: A Comparative Study with Other Oxygen Sources
- Damon B. Farmer
- Matthew Copel
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- Chemistry of Materials
PaperInvestigating microwave loss of SiGe using superconducting transmon qubits
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- Vivekananda P. Adiga
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- Applied Physics Letters
Paper