Physics based PBTI model for accelerated estimation of 10 year lifetime
- Sufi Zafar
- A. Kerber
- et al.
- 2014
- VLSI Technology 2014
Conference paper
Publications
40 results for A. Kerber
The past, present and future of high-k/metal gates
- Kisik Choi
- Takashi Ando
- et al.
- 2013
- ECS Meeting 2013
Conference paperApplication of VRS methodology for the statistical assessment of BTI in MG/HK CMOS devices
- Andreas Kerber
- Eduard Cartier
- 2013
- IEEE Electron Device Letters
PaperCharacterization and optimization of charge trapping in high-k dielectrics
- Eduard Cartier
- Takashi Ando
- et al.
- 2013
- IRPS 2013
Conference paperIntrinsic dielectric stack reliability of a high performance bulk planar 20nm replacement gate high-k metal gate technology and comparison to 28nm gate first high-k metal gate process
- W. McMahon
- C. Tian
- et al.
- 2013
- IRPS 2013
Conference paperBias temperature instability in high-κ/metal gate transistors - Gate stack scaling trends
- Siddarth Krishnan
- Vijay Narayanan
- et al.
- 2012
- IRPS 2012
Conference paperVoltage ramp stress for hot-carrier screening of scaled CMOS devices
- A. Kerber
- W. McMahon
- et al.
- 2012
- IEEE Electron Device Letters
PaperFundamental aspects of HfO 2-based high-k metal gate stack reliability and implications on t inv-scaling
- E. Cartier
- Andreas Kerber
- et al.
- 2011
- IEDM 2011
Conference paperA manufacturable dual channel (Si and SiGe) high-k metal gate CMOS technology with multiple oxides for high performance and low power applications
- S. Krishnan
- U. Kwon
- et al.
- 2011
- IEDM 2011
Conference paperImpact of TDDB in MG/HK devices on circuit functionality in advanced CMOS technologies
- Andreas Kerber
- D. Lipp
- et al.
- 2011
- IEDM 2011
Conference paper