Learning from native defects on EUV mask blanks
- Emily Gallagher
- Alfred Wagner
- et al.
- 2014
- SPIE Optics + Photonics 2014
Conference paper
Publications
29 results for Alfred Wagner
Using pattern shift to avoid blank defects during EUVL mask fabrication
- Yoshiyuki Negishi
- Yuki Fujita
- et al.
- 2013
- Photomask and Next-Generation Lithography Mask Technology 2013
Conference paperMitigation of extreme ultraviolet mask defects by pattern shifting: Method and statistics
- Alfred Wagner
- Martin Burkhardt
- et al.
- 2012
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
PaperUnderstanding the trade-offs of thinner binary mask absorbers
- Jaione Tirapu-Azpiroz
- Gregory McIntyre
- et al.
- 2010
- SPIE Photomask Technology + EUV Lithography 2010
Conference paperEvaluation of easily removable pellicle adhesive
- Nancy Zhou
- Monica Barrett
- et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
Conference paperDemonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations
- David Melville
- Alan E. Rosenbluth
- et al.
- 2010
- SPIE Advanced Lithography 2010
Conference paperLithographic qualification of new opaque MoSi binary mask blank for the 32-nm node and beyond
- Greg McIntyre
- Michael Hibbs
- et al.
- 2010
- J. Micro/Nanolithogr. MEMS MOEMS
PaperCr migration on 193nm binary photomasks
- John Bruley
- Geoffrey Burr
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paperExperimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process
- Kafai Lai
- Alan E. Rosenbluth
- et al.
- 2009
- SPIE Advanced Lithography 2009
Conference paperEvaluation of 32nm Advanced immersion lithography pellicles
- N. Zhou
- K. Racette
- et al.
- 2008
- SPIE Photomask Technology + EUV Lithography 2008
Conference paper